photoresist composition containing a dibenzoylmethane derivative, one arilalquilbenzoato derivative and a compound capable of accepting the energy of the excited triplet level said dibenzoylmethane; procedure photostabilization

摘要

photoresist composition, for topical use, characterized by comprising at least in a cosmetically acceptable support: (a) at least one type UV filter dibenzoylmethane derivative, and (b) the 2-feniletilbenzoato of formula: (c) at least one capable of accepting the energy of the excited triplet level said dibenzoylmethane derivative selected from (i) malonate derivatives 4-hydroxy-benzylidene derivatives or 4-hydroxy-cinnamate compound; (Ii) salts piperidinol; (Iii) mixtures thereof.