photoresist composition containing a dibenzoylmethane derivative, a bis-resorcinyltriazine and one compound capable of accepting the energy of the excited triplet level said dibenzoylmethane; procedure photostabilization

摘要

photoresist composition, for topical use, characterized by comprising at least an acceptable soportecosméticamente: (a) at least one type UV filter dibenzoylmethane derivative, and (b) at least one bis-resorcinyltriazine, and (c) at least one compound capable of accepting the energy of the excited level t riplete of said derivative selected dedibenzoilmetano entrei. derivatives of 4-hydroxy-benzylidene malonate derivatives or 4-hydroxy-cinnamate; ii. salts piperidinol; iii. mixtures thereof.