首页> 外国专利> PRODUCTION OF THIN FILMS HAVING PHOTOVOLTAIC PROPERTIES AND CONTAINING A I-III-VI2-TYPEALLOY, COMPRISING SUCCESSIVE ELECTRODEPOSITS AND THERMAL POST-TREATMENT

PRODUCTION OF THIN FILMS HAVING PHOTOVOLTAIC PROPERTIES AND CONTAINING A I-III-VI2-TYPEALLOY, COMPRISING SUCCESSIVE ELECTRODEPOSITS AND THERMAL POST-TREATMENT

机译:具有光电性能且包含I-III-VI 2 型合金,包含成功的电沉积和热后处理的薄膜的生产

摘要

The invention relates to the production of a thin film having photovoltaic properties, containing a I-III-VI2-type alloy and deposited by electrolysis, including the following steps: (a) successive deposits of layers of metallic elements I and III; and (b) thermal post-treatment with the addition of element VI. In particular, step (a) comprises the following operations: (a1) depositing a multi-layer structure comprising at least two layers of element I and two layers of element III, deposited in an alternate manner; and (a2) annealing said structure before adding element VI in order to obtain a I-III alloy.
机译:本发明涉及具有光电性质的薄膜的生产,该薄膜包含I-III-VI 2 型合金并通过电解沉积,包括以下步骤:(a)连续沉积一层金属元素I和III; (b)添加元素VI的热后处理。特别地,步骤(a)包括以下操作:(a1)沉积以交替方式沉积的包括至少两层元素I和两层元素III的多层结构; (a2)在添加元素VI之前对所述结构进行退火以获得I-III合金。

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