SEMICONDUCTOR INSTALLATION, CONTAINING AT-LEAST ALSO A LONG NARROW SEMICONDUCTOR SUBSTRATE TRANSFER / PROCESSING TUNNEL-ARRANGEMENT TO DURING ITS OPERATION THE UNINTERRUPTEDLY TAKING PLACE OF A TOTAL SEMICONDUCTOR PROCESSING / TREATMENT- PROCESS OF THE THEREIN DISPLACING SEMICONDUCTOR SUBSTRATES

摘要

The invention relates to a semiconductor installation, containing at-least also a long, relatively small semiconductor substrate transfer/processing tunnel-arrangement, wherin during its operation the at-least also taking place of successive semiconductor processings of the successive semiconductor substrate-sections, typically almost uninterruptedly displacing there through, on behalf of in the exit-section of this installation by means of dividing thereof the accomplishing of semiconductor chips.