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Development of a Photoelectrochemical Etch Process to Enable Heterogeneous Substrate Integration of Epitaxial III-Nitride Semiconductors.

机译：开发光电化学蚀刻工艺以实现外延III-氮化物半导体的异质衬底整合。

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Parameshwaran, V.; Chung, R. B.; Kelley, S.; Olver, K.; Connelly, B. C.; Sampath, A.; Reed, M. L.;
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年度 2017
页码 1-18
总页数 18
原文格式 PDF
正文语种 eng
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关键词
Photoelectrochemical Etch Process; Epitaxial III-Nitride Semiconductors;

机译：光电化学蚀刻工艺;外延III-氮化物半导体;

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专利

1. Substrates and epitaxial deposition processes for Group III-nitride thin films and power device heterostructures [J] . Davis Robert F. MRS bulletin . 2015,第5期

机译：III族氮化物薄膜和功率器件异质结构的衬底和外延沉积工艺
2. Dislocation behaviour in III-nitride epitaxial films grown on vicinal sapphire (0001) substrates [J] . X. Q. Shen, H. Matsuhata, H. Okumura Physica Status Solidi. C, Conferences and critical reviews . 2006,第6期

机译：在邻域蓝宝石（0001）衬底上生长的III型氮化物外延膜中的位错行为
3. Facile preparation of nanoflower structured WO3 thin film on etched titanium substrate with high photoelectrochemical performance [J] . Gu Yingjie, Zheng Wenqiang, Bu Yuyu Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry . 2019,第期

机译：高光电化学性能的纳米摩尔结构WO3薄膜的纳米λ结构化的制备
4. The research about the III-nitride compounds epitaxially grown on Si substrate [C] . Aiping Zhao, Hong Deng, Feng Liu, International Conference on Chemical, Material and Metallurgical Engineering . 2012

机译：关于Si衬底上外延生长的III-氮化物化合物的研究
5. Heterogeneous Integration of III-V Multijunction Solar Cells on Si Substrate: Cell Design & Modeling, Epitaxial Growth & Fabrication. [D] . Jain, Nikhil. 2015

机译：Si衬底上III-V多结太阳能电池的异质集成：电池设计与建模，外延生长与制造。
6. A New Method for Lift-off of III-Nitride Semiconductors for Heterogeneous Integration [O] . KeYan Zang, DavyWC Cheong, HongFei Liu, 2010

机译：一种用于异质集成的III型氮化物半导体剥离的新方法
7. Atomically flat and uniform relaxed III–V epitaxial films on silicon substrate for heterogeneous and hybrid integration [O] . Martin Holland, Mark van Dal, Blandine Duriez, 2017

机译：在硅衬底上原子平整且均匀的松弛III-V外延薄膜，用于异构和杂交集成

Development of a Photoelectrochemical Etch Process to Enable Heterogeneous Substrate Integration of Epitaxial III-Nitride Semiconductors.

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