首页> 外国专利> TREATMENT, BEFORE THE BONDING OF A MIXED COPPER OXIDE SURFACE, BY A PLASMA CONTAINING NITROGEN AND HYDROGEN

TREATMENT, BEFORE THE BONDING OF A MIXED COPPER OXIDE SURFACE, BY A PLASMA CONTAINING NITROGEN AND HYDROGEN

机译:结合氮和氢的等离子体处理混合的氧化铜表面之前

摘要

A method of bonding between a first surface (1) provided with at least one copper zone (3), surrounded by a silicon oxide zone (4) and a second surface (1') comprises an operation of treating the first surface (1) with a plasma before the first surface (1) is brought into contact with the second surface (V). The plasma is generated from a gas source containing an agent for nitriding the silicon oxide and an agent for reducing the copper oxide, based on hydrogen. The gas source may comprise an N2/NH3 and/or N2/H2 gas mixture or even an N2O/H2 gas mixture or else ammonia gas, which then acts both as nitriding agent and reducing agent. The plasma obtained from this gas source then necessarily comprises nitrogen and hydrogen, thereby making it possible, in a single operation, to provide a strong bond between the first and second surfaces (1, 1').
机译:在具有至少一个被氧化硅区域(4)围绕的铜区域(3)的第一表面(1)与第二表面(1')之间的结合方法包括处理第一表面(1)的操作。在第一表面(1)与第二表面(V)接触之前,先用等离子体处理。等离子体由气体源产生,该气体源包含基于氢的氮化硅的试剂和还原氧化铜的试剂。气体源可以包含N 2 / NH 3 和/或N 2 / H 2 气体混合物或甚至是N 2 O / H 2 气体混合物或氨气,它们同时充当氮化剂和还原剂。然后,从该气体源获得的等离子体必然包含氮和氢,从而使得在一次操作中就可以在第一和第二表面(1、1')之间提供牢固的结合。

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