首页> 外国专利> PLC SYSTEM FOR AUTOMATICALLY CONTROLLING PID FOR MAINTAINING TARGET WATER QUALITY VALUE BY DEPOSITING WATER TREATMENT CHEMICAL

PLC SYSTEM FOR AUTOMATICALLY CONTROLLING PID FOR MAINTAINING TARGET WATER QUALITY VALUE BY DEPOSITING WATER TREATMENT CHEMICAL

机译:自动控制PID的PLC系统,通过处理水化学物质来保持目标水质值

摘要

A PLC system for automatically controlling PID for controlling the target value for residual chemicals in a water treatment facility, according to the present invention, comprises: a PID control software; a main control room computer for generating a PID control command regarding chemical deposit amount and relaying same to a field control PLC in a chemical room; the field control PLC in the chemical room for receiving a PID control command signal from the main control room computer and performing computing and control; and a chemical depositor in the chemical room for receiving the control signal from the field control PCL and depositing the indicated amount of chemicals, wherein the main control room computer calculates an initial setting value for the chemical deposit amount and generates the PID control command.
机译:根据本发明的用于自动控制PID的PLC系统,该PID用于控制水处理设施中残留化学物质的目标值。主控制室计算机,用于产生关于化学沉积量的PID控制命令,并将其中继到化学室中的现场控制PLC。化学室中的现场控制PLC,用于从主控制室计算机接收PID控制命令信号并进行计算和控制;以及在化学室中的化学沉积器,用于接收来自现场控制PCL的控制信号并沉积指示量的化学物质,其中主控制室计算机计算化学沉积量的初始设置值并生成PID控制命令。

著录项

  • 公开/公告号WO2012060518A1

    专利类型

  • 公开/公告日2012-05-10

    原文格式PDF

  • 申请/专利权人 LEE TAE IL;KIM HO JIN;

    申请/专利号WO2011KR00501

  • 发明设计人 LEE TAE IL;KIM HO JIN;

    申请日2011-01-25

  • 分类号G05B19/05;G05B11/36;

  • 国家 WO

  • 入库时间 2022-08-21 17:16:09

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