NOVEL DIAZACROWN BARIUM AND STRONTIUM PRECURSORS FOR VAPOR PHASE DEPOSITION OF THIN FILM

摘要

A metal source precursor, comprising a diazacrown ligand, M[-N-C(R¹ R²)C(R³ R⁴)-O-C(R⁵ R⁶)C(R⁷ R⁸)-O-C(R⁹ R¹⁰)C(R¹¹ R¹²)-]₂ of formula (I): wherein: M is strontium or Barium; R¹-R¹² are organic ligands independently selected in the group consisting of H, a linear or branched function alkyl, aryl, alkenyl, alkylsilyl, alkylamides, alkylsilylamides, alkoxide, fluoroalkyl comprising from 1 to 5 atom of carbon.