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CHEMICALLY AMPLIFIED PHOTO-RESIST COMPOSITION FOR MICRO LENSES AND THE MICRO LENSES MANUFACTURED USING THE SAME CAPABLE OF IMPROVING THE TRANSMITTANCE AND THE HEAT RESISTANCE CHARACTERISTIC OF THE MICRO LENSES
CHEMICALLY AMPLIFIED PHOTO-RESIST COMPOSITION FOR MICRO LENSES AND THE MICRO LENSES MANUFACTURED USING THE SAME CAPABLE OF IMPROVING THE TRANSMITTANCE AND THE HEAT RESISTANCE CHARACTERISTIC OF THE MICRO LENSES
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机译:用于微透镜的化学放大的光致抗蚀剂组合物和使用改善微透镜的透射率和耐热性的能力制造的微透镜
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PURPOSE: A chemically amplified photo-resist composition for micro lenses and the micro lenses manufactured using the same are provided to maintain the transmittance of the micro lenses by preventing the coloring phenomenon of the micro lenses at high temperatures.;CONSTITUTION: A chemically amplified photo-resist composition for micro lenses includes a copolymer resin represented by chemical formula 1, a copolymer resin represented by chemical formula 2, an acid generator, and a quencher. In the chemical formulas 1 and 2, the R1 is a hydrogen element or a methyl group. The R2 is a C1 to C10 linear, branched, or cyclic alkyl group. The R3 is a hydroxyl group. The R4 is a hydrogen element or a methyl group. The R5 is a hydrogen element or a C3 to C10 cyclic compound. The R6 is a C1 to C5 alkyl group substituted or non-substituted oxetyl group. The a1, b1, a2, b2, and c2 are the molar ratios of each monomer and are respectively the real numbers of 0 to 1.;COPYRIGHT KIPO 2012
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机译:目的:提供用于微透镜的化学放大的光致抗蚀剂组合物和使用该组合物制造的微透镜,以通过防止微透镜在高温下的着色现象来保持微透镜的透射率。;组成:化学放大的光致抗蚀剂。 -微透镜用抗蚀剂组合物包括化学式1表示的共聚物树脂,化学式2表示的共聚物树脂,产酸剂和淬灭剂。在化学式1和2中,R 1是氢元素或甲基。 R 2为C 1至C 10的直链,支链或环状烷基。 R 3是羟基。 R 4是氢元素或甲基。 R 5为氢元素或C 3至C 10环状化合物。 R 6为碳数1〜5的烷基的取代或未取代的氧杂环丁烷基。 a1,b1,a2,b2和c2是每种单体的摩尔比,分别是0到1的实数; COPYRIGHT KIPO 2012
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