首页> 外国专利> CORRECTION SYSTEM OF AN IN-SITU GAS ANALYZING SYSTEM, WHICH CAN COMPARE TO AND ANALYZE CONCENTRATION OF STANDARD GAS

CORRECTION SYSTEM OF AN IN-SITU GAS ANALYZING SYSTEM, WHICH CAN COMPARE TO AND ANALYZE CONCENTRATION OF STANDARD GAS

机译:可以对标准气体浓度进行比较和分析的原位气体分析系统的校正系统

摘要

PURPOSE: A correction system of an in-situ gas analyzing system is provided to rapidly correct the linearity of a spectral performance of in-situ gas analyzing system.;CONSTITUTION: A correction system of an in-situ gas analyzing system comprises a first correction cell(110), second correction cells(120A,120B) and an in-situ gas analyzing system(130). An inlet port(111), in which the reference gas of fixed concentration is inserted, is formed on one end of the first correction cell. A vent, in which the reference gas is exhausted, is formed on the other end of the first correction cell. The light source radiates the light of regularity wavelength to the first correction cell. The spectral part lights receive the light of light source and passes through the first correction cell. The spectral part measures the actual concentration of the reference gas of the first correction cell.;COPYRIGHT KIPO 2012
机译:目的:提供一种原位气体分析系统的校正系统,以快速校正原位气体分析系统的光谱性能的线性。;组成:原位气体分析系统的校正系统包括第一校正单元(110),第二校正单元(120A,120B)和原位气体分析系统(130)。在第一校正单元的一端形成有进气口(111),在该进气口中插入有固定浓度的基准气体。在第一校正单元的另一端上形成有排出基准气体的排气口。光源将规则波长的光辐射到第一校正单元。光谱部分光接收光源的光并穿过第一校正单元。光谱部分测量第一个校正池中参考气体的实际浓度。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20110125843A

    专利类型

  • 公开/公告日2011-11-22

    原文格式PDF

  • 申请/专利权人 DONGWOO OPTRON;

    申请/专利号KR20100045440

  • 发明设计人 CHA HEE SANG;YEON KYU CHEOL;

    申请日2010-05-14

  • 分类号G01N21/25;G01N21/93;

  • 国家 KR

  • 入库时间 2022-08-21 17:11:37

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