Method for manufacturing polishing slurry containing nano-diamonds, Polishing slurry manufactured by the method, and Polishing method using the polishing slurry

摘要

PURPOSE: A polishing slurry is provided to minimally reduce surface roughness and to improve planarity and to reduce surface roughness of a wafer and plate in polishing. CONSTITUTION: A method for manufacturing a surface abrasive comprises a step of mixing 60~72 wt% colloidal silica(SiO2), 0.5~3 wt% diamond with nano diameter, and 27.5~37 wt% ethylene glycol. A polishing method using a surface abrasive including nanodiamond comprises the steps of: positioning object(S) on a polishing platen(10) and a polishing pad(15); and providing the abrasive on the polishing platen and the polishing pad, an rotating the polishing platen and the polishing pad to polish the object.