METHOD FOR MANUFACTURING A UNIFORM CIS OR CIGS THIN FILM AT A LOW TEMPERATURE AND A NON-VACUUM CONDITION

摘要

PURPOSE: A method for manufacturing a uniform CIS or CIGS thin film is provided to obtain a thin film with various shapes and phases by easily controlling the composition of solutions, the density of impurities, reaction time, and temperature.;CONSTITUTION: A first electrode layer(110) is formed on a substrate(100). A seed particle layer(120) including a copper indium compound seed particle is formed on the first electrode layer. Solutions(130) with water soluble precursors are spread on the seed particle layer. The solutions with the water soluble precursors include organic solvents and/or inorganic solvents. The spread solutions are changed into a thin film(140) at a high temperature.;COPYRIGHT KIPO 2012