首页> 外国专利> METHOD FOR FORMING A CAPACITOR AND A SEMICONDUCTOR DEVICE USING THE SAME CAPABLE OF IMPROVING THE NOISE ATTENUATION EFFICIENCY OF A HIGH FREQUENCY POWER VOLTAGE

METHOD FOR FORMING A CAPACITOR AND A SEMICONDUCTOR DEVICE USING THE SAME CAPABLE OF IMPROVING THE NOISE ATTENUATION EFFICIENCY OF A HIGH FREQUENCY POWER VOLTAGE

机译:利用提高高频电源电压的噪声衰减效率的能力来形成电容器和半导体器件的方法

摘要

PURPOSE: A method for forming a capacitor and a semiconductor device using the same are provided to improve the noise attenuation efficiency of a decoupling capacitor by decreasing the resistance of a wire which connects the decoupling capacitor to a power voltage.;CONSTITUTION: A first MOS capacitor(MOS_CP1) includes a first gate and a first source/drain. A second MOS capacitor(MOS_ CP2) includes a second gate and a second source/drain. A first cylinder capacitor(CYL_CP1) includes a top electrode, a first dielectric layer, and a first bottom electrode. A second cylinder capacitor(CYL_CP2) includes a top electrode, a second dielectric layer, and a second bottom electrode. A metal wire(10A,10B) connects the gate to the bottom electrode.;COPYRIGHT KIPO 2012
机译:目的:提供一种用于形成电容器的方法和使用该方法的半导体器件,以通过减小将去耦电容器连接至电源电压的导线的电阻来提高去耦电容器的噪声衰减效率。组成:第一MOS电容器(MOS_CP1)包括第一栅极和第一源极/漏极。第二MOS电容器(MOS_CP2)包括第二栅极和第二源极/漏极。第一圆柱电容器(CYL_CP1)包括顶部电极,第一介电层和第一底部电极。第二圆柱电容器(CYL_CP2)包括顶部电极,第二介电层和第二底部电极。金属线(10A,10B)将栅极连接到底部电极。; COPYRIGHT KIPO 2012

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