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METHOD FOR FORMING A CAPACITOR AND A SEMICONDUCTOR DEVICE USING THE SAME CAPABLE OF IMPROVING THE NOISE ATTENUATION EFFICIENCY OF A HIGH FREQUENCY POWER VOLTAGE
METHOD FOR FORMING A CAPACITOR AND A SEMICONDUCTOR DEVICE USING THE SAME CAPABLE OF IMPROVING THE NOISE ATTENUATION EFFICIENCY OF A HIGH FREQUENCY POWER VOLTAGE
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机译:利用提高高频电源电压的噪声衰减效率的能力来形成电容器和半导体器件的方法
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摘要
PURPOSE: A method for forming a capacitor and a semiconductor device using the same are provided to improve the noise attenuation efficiency of a decoupling capacitor by decreasing the resistance of a wire which connects the decoupling capacitor to a power voltage.;CONSTITUTION: A first MOS capacitor(MOS_CP1) includes a first gate and a first source/drain. A second MOS capacitor(MOS_ CP2) includes a second gate and a second source/drain. A first cylinder capacitor(CYL_CP1) includes a top electrode, a first dielectric layer, and a first bottom electrode. A second cylinder capacitor(CYL_CP2) includes a top electrode, a second dielectric layer, and a second bottom electrode. A metal wire(10A,10B) connects the gate to the bottom electrode.;COPYRIGHT KIPO 2012
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