首页> 外国专利> MASKLESS EXPOSING APPARATUS AND AN EXPOSING METHOD CAPABLE OF IMPROVING THE ILLUMINANCE UNIFORMITY OF EXPOSED PATTERNS BY INSERTING A DOSE CONTROLLING FILTER AT THE PRE-SET POSITION OF AN OPTICAL SYSTEM

MASKLESS EXPOSING APPARATUS AND AN EXPOSING METHOD CAPABLE OF IMPROVING THE ILLUMINANCE UNIFORMITY OF EXPOSED PATTERNS BY INSERTING A DOSE CONTROLLING FILTER AT THE PRE-SET POSITION OF AN OPTICAL SYSTEM

机译:通过在光学系统的预设位置插入剂量控制滤光片来改善曝光图案的照明均匀性的无影印设备和曝光方法

摘要

PURPOSE: A maskless exposing apparatus and an exposing method are provided to precisely implement an exposing process although the repeated scanning number of the maskless exposing apparatus is reduced.;CONSTITUTION: A maskless exposing apparatus includes a light illuminating part(102), a space photo-modulator(104), a beam expander(106), a micro lens array(108), and a projection lens(110). The space photo-modulator receives light from the light illuminating part and emits light with pre-set patterns. The beam expander expands light emitted from the space photo-modulator. The micro lens array separates the expanded light into a plurality of light and collects the separated light. A dose controlling filter(107) is arranged between the space photo-modulator and the beam expander or between the beam expander and the micro lens array.;COPYRIGHT KIPO 2012
机译:目的:提供一种无掩模曝光设备和一种曝光方法,以精确执行曝光过程,尽管减少了无掩模曝光设备的重复扫描次数。;组成:一种无掩模曝光设备,包括照明部分(102),空间照片调制器(104),扩束器(106),微透镜阵列(108)和投影透镜(110)。空间光调制器接收来自照明部分的光并且发射具有预定图案的光。扩束器使从空间光调制器发射的光扩展。微透镜阵列将扩展的光分离为多个光并收集分离的光。在空间光调制器与扩束器之间或在扩束器与微透镜阵列之间布置有剂量控制滤光器(107)。COPYRIGHTKIPO 2012

著录项

  • 公开/公告号KR20120038800A

    专利类型

  • 公开/公告日2012-04-24

    原文格式PDF

  • 申请/专利权人 LG ELECTRONICS INC.;

    申请/专利号KR20100100453

  • 申请日2010-10-14

  • 分类号G03F7/20;H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 17:10:11

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