LIQUID TREATMENT METHOD CAPABLE OF IMPROVING STRIPPING PERFORMANCE OF A RESIST FILM, A RECORDING MEDIUM WHICH RECORDS A PROGRAM FOR EXECUTING THE SAME, AND A LIQUID TREATMENT APPARATUS

摘要

PURPOSE: A liquid treatment method, a recording medium which records a program for executing the same, and a liquid treatment apparatus are provided to eliminate a resist film without eliminating an under-layer by providing a process liquid in which sulfuric acid and acetic acid are mixed.;CONSTITUTION: A substrate is retained by a substrate retention part(20). A mixing part mixes sulfuric acid and acetic acid with a predetermined ratio. A supply part(40) supplies the mixed sulfuric acid and acetic acid on the substrate. A resist film is eliminated from the substrate. The temperature of process liquid is 120°C or higher.;COPYRIGHT KIPO 2012