PLASMA PROCESSING APPARATUS AND A PLASMA PROCESSING METHOD CAPABLE OF MINIMIZING DAMAGE TO A DIELECTRIC WINDOW DUE TO HYDROGEN IONS

摘要

PURPOSE: A plasma processing apparatus and a plasma processing method are provided to suppress damage to a high frequency coil due to heat from plasma.;CONSTITUTION: A plasma generating chamber generates plasma by exciting process gas. A plasma processing chamber(20) is connected to the plasma generating chamber. A holder(15) is arranged in the plasma processing chamber. A high frequency antenna(140) is installed outside a dielectric window(13). A high frequency power source(150) applies high frequency power to a high frequency antenna.;COPYRIGHT KIPO 2012