ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, A RESIST FILM BASED ON THE COMPOSITION, AND A PATTERN FORMING METHOD BASED ON THE COMPOSITION CAPABLE OF IMPROVING EXPOSURE LATITUDE BY INCLUDING A SPECIFIC COMPOUND

摘要

PURPOSE: An active ray-sensitive or radiation-sensitive resin composition, a resist film based on the composition, and a pattern forming method based on the composition are provided to form rectangular-shaped patterns.;CONSTITUTION: An active ray-sensitive or radiation-sensitive resin composition includes a compound represented by chemical I and a resin. The compound generates acid by the radiation of active rays or radiation rays. The dissolution of the resin to an alkali developing solution is increased by the action of the acid. In chemical formula I, X is O, S, or -N(Rx)-; R1 and R2 are respectively alkyl groups, cycloalkyl groups, or aryl groups; R3-R9 respectively hydrogen atoms, alkyl groups, cycloalkyl groups, alkoxy groups, alkoxycarbonyl groups, acyl groups, alkylcarbonyloxy groups, aryl groups, aryloxy groups, aryloxycarbonyl groups, or arylcarbonyloxy groups; Rx is a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, an alkenyl group, an alkoxycarbonyl group, an aryl, an arylcarbonyl group, or an aryloxycarbonyl group; R1 and R2 are capable of forming a ring; two or more of R6-R9, R3 and R9, R4 and R5, R5 and Rx, and R6 and Rx are respectively capable of forming rings; Xf is respectively F or at least one F substituted alkyl group; R10 and R11 are respectively hydrogen atoms, fluorine atoms, or alkyl groups and R10 and R11 are respectively identical or different if the numbers of R10 and R11 are plural; L is a divalent coupling group and is identical or different if the number of L is plural; A is a cyclic organic group; W is (O3S-)^-, -RfSO_2-(N^-)-SO_2-, Rf-CO-(N^-)-SO_2-, Rf-SO_2-(N^-)-CO-; and Rf is an at least one F substituted alkyl group.;COPYRIGHT KIPO 2012