ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, A CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND A RESIST FILM AND A PATTERN FORMING METHOD USING THE COMPOSITIONS CAPABLE OF IMPROVING THE SIDE-LOBE RESISTANCE CHARACTERISTIC AND THE SIDEWALL VERTICALITY OF THE COMPOSITIONS

摘要

PURPOSE: An active ray-sensitive or radiation-sensitive resin composition, a chemically amplified resist composition, and a resist film and a pattern forming method using the compositions are provided to form vertical sidewalls in a contact hole pattern forming process and to reduce the number of blob defects.;CONSTITUTION: An active ray-sensitive or radiation-sensitive resin composition includes a resin, a compound and a basic compound. The resin includes repeating units which are represented by chemical formulas 1-I, 1-II, and 1-III. The dissolution of the resin with respect to an alkaline developing solution is increased by the action of acid. The compound generates acid by the irradiation of active ray or radiation. The basic compound is represented by chemical formula 1-IV.;COPYRIGHT KIPO 2012