首页> 外国专利> METHOD OF MANUFACTURING RERAM OF THREE-DIMENSIONAL STACKED MEMORY TYPE HAVING INDEPENDENT MEMORY CELL STRUCTURE AND THE THREE-DIMENSIONAL STACKED MEMORY

METHOD OF MANUFACTURING RERAM OF THREE-DIMENSIONAL STACKED MEMORY TYPE HAVING INDEPENDENT MEMORY CELL STRUCTURE AND THE THREE-DIMENSIONAL STACKED MEMORY

机译:具有独立记忆细胞结构和三维堆叠记忆的三维堆叠记忆体的制造方法

摘要

PURPOSE: A method of manufacturing a resistive random access memory device of a three-dimensional stacked memory type having an independent memory cell structure and the three-dimensional stacked memory are provided to control a limit to miniaturization by producing the resistive random access memory device of a three-dimensional stacked memory structure. CONSTITUTION: A silicon substrate(10) is provided. An insulating material layer(20) is deposited on the top of the substrate. A bottom electrode layer(30) is deposited on the insulating material layer. A metal oxide(40) having resistive switching characteristics is deposited on the substrate. An upper electrode(50) is formed on a top insulating material layer.
机译:用途:制造具有独立存储单元结构的三维堆叠式存储器的电阻式随机存取存储装置的方法和三维堆叠式存储器被提供以通过制造电阻式随机存取存储器来控制小型化的极限。三维堆栈式存储器结构。组成:提供了一个硅基板(10)。绝缘材料层(20)沉积在基板的顶部上。底部电极层(30)沉积在绝缘材料层上。具有电阻切换特性的金属氧化物(40)沉积在基板上。在顶部绝缘材料层上形成上部电极(50)。

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