首页> 外国专利> SILICON BASED SOLAR CELL WITH EXCELLENT LIGHT ABSORPTION AND PHOTOELECTRIC TRANSFORMATION AND METHOD OF MANUFACTURING THE SOLAR CELL

SILICON BASED SOLAR CELL WITH EXCELLENT LIGHT ABSORPTION AND PHOTOELECTRIC TRANSFORMATION AND METHOD OF MANUFACTURING THE SOLAR CELL

机译:具有出色的光吸收和光电转换的硅基太阳能电池及其制造方法

摘要

PURPOSE: A silicon type solar cell with excellent light absorption and photoelectric transformation efficiency and a manufacturing thereof are provided to form an emitter layer using an epitaxial growing method, thereby enabling to make the thickness of the emitter layer thicker than an existed emitter layer and simplifying a manufacturing method. CONSTITUTION: A first conductive type silicon substrate is prepared(S310). The upper surface of the first conductive type silicon substrate is textured(S320). A second conductive type silicon layer(320) which is opposite to a first conductive type is formed using an epitaxial growing method on the first conductive type silicon substrate after texturing(S330). The first conductivity type silicon substrate(310) has a 1,1,1 crystallographic direction and the texturing is done by a dry etching method.
机译:用途:提供具有优异的光吸收和光电转换效率的硅型太阳能电池及其制造,以利用外延生长方法形成发射极层,从而能够使发射极层的厚度比现有的发射极层厚并且简化一种制造方法。组成:准备第一导电型硅衬底(S310)。第一导电类型硅衬底的上表面被纹理化(S320)。在纹理化之后,在第一导电类型硅基板上使用外延生长方法形成与第一导电类型相反的第二导电类型硅层(320)。第一导电型硅衬底(310)具有1,1,1的结晶方向,并且通过干蚀刻法进行纹理化。

著录项

  • 公开/公告号KR101132292B1

    专利类型

  • 公开/公告日2012-04-05

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20110009743

  • 发明设计人 김기홍;박근주;박건;

    申请日2011-01-31

  • 分类号H01L31/042;H01L31/0236;H01L31/18;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:19

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