首页> 外国专利> MANUFACTURING PROCESS OF ELEMENT INCLUDE METAL FILM HAVING NANO-SCALE APERTURE, NANO-SCALE ELEMENT, OPTICAL LENS AND PLASMONIC OPTICAL HEAD MANUFACTURED THE METHOD

MANUFACTURING PROCESS OF ELEMENT INCLUDE METAL FILM HAVING NANO-SCALE APERTURE, NANO-SCALE ELEMENT, OPTICAL LENS AND PLASMONIC OPTICAL HEAD MANUFACTURED THE METHOD

机译:包括具有纳米级孔径,纳米级元素,光学透镜和等离子光学头的金属膜的元件的制造方法

摘要

PURPOSE: A method for manufacturing an element formed with a metal film having a nano opening inside, a nano element manufactured by the same, an optical lens, and a plasmonic optical head are provided to enable the formation of a nano-sized geometric base plate and a nano opening into the desired shape to the desired depth. CONSTITUTION: A sacrificial layer is formed on the surface of an object(S2). A first metal thin film layer is laminated on the sacrificial layer(S3). A focused ion beam passes through the first metal thin film layer and the sacrificial layer, and a groove is formed in the object(S4). A metal layer is reformed on one side of the object, and a second metal thin film layer is formed inside the groove(S5). The sacrificial layer is removed from the surface of the object(S6).
机译:目的:提供一种用于制造由内部具有纳米开口的金属膜形成的元件的方法,由其制造的纳米元件,光学透镜和等离子光学头,以能够形成纳米尺寸的几何基板。纳米开口形成所需形状至所需深度。组成:在物体表面形成牺牲层(S2)。在牺牲层上层压第一金属薄膜层(S3)。聚焦的离子束穿过第一金属薄膜层和牺牲层,并且在物体中形成凹槽(S4)。在物体的一侧上重整金属层,并且在凹槽内部形成第二金属薄膜层(S5)。从物体表面去除牺牲层(S6)。

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