首页> 外国专利> Strained semiconductor-on-insulator structure and methods for making strained semiconductor-on-insulator structures

Strained semiconductor-on-insulator structure and methods for making strained semiconductor-on-insulator structures

机译:应变绝缘体上半导体结构以及制造应变绝缘体上半导体结构的方法

摘要

The present invention is a semiconductor layer having a strained semiconductor-on insulator structure would -one. According to an embodiment of the invention, a semiconductor-on-insulator structure, the first layer is a glass or glass containing semiconductor material is adhered to a second layer including a ceramic, a semiconductor, and a glass or glass-the CTE of the ceramic the first is selected to belong to the tensile strain (tensile strain) of the first layer. The invention also tensile semiconductor-insulator structure, a method of producing -one. ; A semiconductor, insulator, glass, side, see, tensile strain
机译:本发明是一种具有应变的在绝缘体上的半导体结构的半导体层。根据本发明的实施例,一种绝缘体上半导体结构,第一层是玻璃或包含半导体材料的玻璃,该半导体材料粘附到第二层,该第二层包括陶瓷,半导体和玻璃或玻璃-陶瓷的第一层被选择为属于第一层的拉伸应变(拉伸应变)。本发明还涉及一种拉伸半导体-绝缘体结构,一种制造方法。 ;半导体,绝缘体,玻璃,侧面,拉伸应变

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号