PURPOSE: An external use composition suppressing bio film formation is provided to treat skin inflammation and skin trouble such as barrier damage, skin dryness, or itch. CONSTITUTION: An external use composition contains 0.001-10 weight% of Chamaeryparis obtuse polysaccharide. The composition is applied to base cosmetic, makeup cosmetic, hair cosmetic, body product or ointment. A method for manufacturing Chamaeryparis obtuse polysaccharide comprises: a step of adding water to Chamaeryparis obtuse leaves and stirring for 24 hours to extract; a step of adding ethanol to concentrate and performing ethanol precipitation; and a step of collecting precipitate and drying. The composition has anti-inflammation performance and treats atopic dermatitis.
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