EVAPORATING APPARATUS, APPARATUS FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR CONTROLLING EVAPORATING APPARATUS AND METHOD FOR USING EVAPORATING APPARATUS

摘要

Deposition apparatus 10 is first embedded in the processing vessel 100 and the second processing vessel has a 200, the sparger 110 and the second processing container (200) internal to the first processing container (100) It is an evaporation source 210, connected to each other through the connection pipe 220. First processing vessel 100, the exhaust mechanism for exhaust is connected to the inside to a desired vacuum degree. Vaporized by the deposition source 210, the organic molecules, is ejected from the ejection unit 110 through the connection pipe 220, and adsorbing on the substrate (G), whereby the thin film is formed on a substrate (G) by. 2 by treatment install container 200 and 100, the first process vessel to separate, there is no case that opens to the first process air to the container 100 during the film-forming material replenishment, it can improve the exhaust efficiency.