DEVICE FOR FORMING ORDERED MICROSTRUCTURES dislocations in the surface layer of the semiconductor

摘要

The invention relates to semiconductor processing technologies and materials it can be used in the manufacture of integrated circuits, integrated memory circuits and optoelectronic semiconductor devices, namely for gettering semiconductor and increase the probability of radiative interband transitions in indirect semiconductors.; An object is to provide a simple and efficient device for forming ordered microstructures dislocations uniformly and orderly distributed in a surface layer of the semiconductor.