A method for producing an optical component of synthetic quartz glass with an increased resistance to radiation

摘要

A method for producing an optical component of synthetic quartz glass with an increased resistance to radiation for use in a micro lithography apparatus with an operating wavelength below 250 nm, wherein a quartz glass blank with a hydroxyl group content of less than 250 w - ppm is provided and is subjected to a multi-stage tempering treatment, the method comprising the following step:(a) a first treatment phase, during which the quartz glass blank in an upper temperature range between 1130°C. and 1230°C. during a first treatment time is treated,(b) a cooling of the quartz glass blank with a first, high cooling rate to a quenching temperature below 1100°C, whereby a fictive temperature in the quartz glass with a high mean value of 1100°C or more is established,(c) a second treatment phase, which a cooling of the quartz glass blank with a second cooling rate, which is lower than the first cooling rate and in which the quartz glass blank in a lower temperature range between 950°C. and 1100°C. during a second treatment time is treated in such a way that, in the quartz glass a fictitious..