Sputter target of an alloy on al - base of the al - ni - la - si - system and method for the production thereof

摘要

Sputter target of an alloy on al - base of the al - ni - la - si - system, the ni, la and si, wherein, when a section of (1 / 4) t to (3 / 4) t, t being the thickness of the sputtering targets means in a cross-section vertical to a plane of the sputtering targets with a scanning electron microscope at 2000 - (magnification is investigated,(1) a total area of an intermetallic compound of the al - ni - system having an average particle diameter of 0,3 μm to 3 μm, based on a total area of the entire intermetallic compound of the al - ni - system, 70% or more, expressed as the surfaces of a break in part, and wherein the intermetallic compound of the al - ni - system is mainly composed of al and ni, and(2) a total area of an intermetallic compound of the al - ni - la - si - system having an average particle diameter of 0,2 μm to 2 μm, based on a total area of the entire intermetallic compound of the al - ni - la - si - system, 70% or more, expressed as the surfaces of a break in part, and wherein the intermetallic compound of the al - ni - la - si - system is mainly composed of al, ni, la and si is composed.