Illumination optics for microlithography projection exposure apparatus as well as an illuminating system and with such an illumination optics

摘要

Illumination optics (4) for microlithography for the guidance of an illuminating light - bundle (14) of a radiation source (3) towards an object field (5) in an object plane (6)– with a field facets mirror (17) with a plurality of field facets (23) for presetting a defined illumination conditions in the object field (5),– with a the field facets mirror (17) arranged behind optical system (18, 19) for the transfer of the illumination light (14) in the object field (5),– the sequence optical system (18, 19) an aperture diaphragm beveled mirror (18) with a plurality of pupil facets (31), wherein the field facets (23) the pupil facets (31) are individually allocated in each case, so that portions of the illuminating light - bundle (14), which in each case on one of the field facets (23), by means of the associated pupils facet (31) and further to the object field (5) are guided,– wherein at least some of the field facets (23) in the individual mirrors (29) are subdivided, the individual reflectors - illumination ducting at (30, 33) for guiding on the individual reflectors (29) incident subportions of the illuminating light - bundle (14) specifying,– the individual mirrors..