首页> 外国专利> Replenishing acid in cleaning bath during cleaning polycrystalline silicon fragments comprises measuring concentrations of acid and determining average acid consumption

Replenishing acid in cleaning bath during cleaning polycrystalline silicon fragments comprises measuring concentrations of acid and determining average acid consumption

机译:在清洗多晶硅碎片期间在清洗槽中补充酸包括测量酸的浓度并确定平均酸消耗

摘要

Replenishing an acid in a cleaning bath during cleaning polycrystalline silicon fragments comprises (a) measuring the concentrations of the acid in the cleaning bath using an analysis device, in a discontinuous manner, and (b) determining the average acid consumption as a slope of a straight line determined by extrapolating over at least two of the measured values, and an automatic control system, where the slope of the extrapolated straight line serves as a control variable.
机译:在清洗多晶硅碎片期间在清洗槽中补充酸包括:(a)使用分析装置以不连续的方式测量清洗槽中酸的浓度,以及(b)将平均酸消耗确定为a的斜率通过对至少两个测量值进行外推而确定的直线,以及自动控制系统,其中外推直线的斜率用作控制变量。

著录项

  • 公开/公告号DE102011005995A1

    专利类型

  • 公开/公告日2012-09-27

    原文格式PDF

  • 申请/专利权人 WACKER CHEMIE AG;

    申请/专利号DE20111005995

  • 发明设计人 WOCHNER HANNS DR.;

    申请日2011-03-23

  • 分类号G05D11/08;G05D21/00;C01B33/037;

  • 国家 DE

  • 入库时间 2022-08-21 17:05:05

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