首页> 外国专利> PRETREATMENT METHOD FOR ELECTROPLATING, AND METHOD OF PRODUCING COPPER CLAD LAMINATED RESIN FILM BY ELECTROPLATING METHOD INCLUDING THE PRETREATMENT METHOD

PRETREATMENT METHOD FOR ELECTROPLATING, AND METHOD OF PRODUCING COPPER CLAD LAMINATED RESIN FILM BY ELECTROPLATING METHOD INCLUDING THE PRETREATMENT METHOD

机译:电镀的预处理方法,以及包括预处理方法的电镀方法制备铜包层层压树脂薄膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a method of depositing an electroplated film reduced in fine surface defect on a long-length conductive substrate conveyed roll to roll.;SOLUTION: A pretreatment method performed before continuously performing electroplating on a long-length film F with a thin film as a long-length conductive substrate conveyed by a roll to roll system by immersing it in an electroplating bath 21 includes the process of immersing the long-length film F with the thin film in a cleaning bath filled with a chemical liquid 53 such as, for example, sulfuric acid or the like as a cleaning solution and the process of nipping the long-length film F with the thin film by one pair of ringer rolls 55 of 70-90° in surface hardness directly after immersing it in the cleaning bath.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种方法,该方法将在表面上缺陷少的电镀膜沉积在卷对卷的长导电基体上;解决方案:一种预处理方法,该方法是在连续电镀长膜F之前进行通过将薄膜浸入到电镀槽21中而通过辊对辊系统输送的作为长导电性基板的薄膜包括将长膜F和带有薄膜的薄膜浸入填充有化学液体的清洗槽53中的过程诸如硫酸之类的清洁溶液,以及将一对长条薄膜F浸入其中后,立即通过一对表面硬度为70-90°的林格辊55将长条薄膜F与薄膜夹持的过程。清洗浴;版权所有:(C)2013,日本特许厅&INPIT

著录项

  • 公开/公告号JP2013181180A

    专利类型

  • 公开/公告日2013-09-12

    原文格式PDF

  • 申请/专利权人 SUMITOMO METAL MINING CO LTD;

    申请/专利号JP20120043749

  • 发明设计人 NISHIHARA SHINPEI;

    申请日2012-02-29

  • 分类号C25D5/34;C25D7/06;C25D5/56;C23G3/02;C25F7/00;B08B3/04;B08B11/00;

  • 国家 JP

  • 入库时间 2022-08-21 17:03:16

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