首页> 外国专利> METHOD FOR MANUFACTURING PHASE TYPE DIFFRACTION GRATING FOR X-RAY TALBOT INTERFEROMETER

METHOD FOR MANUFACTURING PHASE TYPE DIFFRACTION GRATING FOR X-RAY TALBOT INTERFEROMETER

机译:X射线干涉仪相型衍射光栅的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a method capable of easily and highly accurately manufacturing a phase type diffraction grating for an x-ray Talbot interferometer without requiring an exposure mask.SOLUTION: The method for manufacturing a phase type diffraction grating 10 for an x-ray Talbot interferometer, which is configured by forming a plurality of ridge parts 10b and interposing a resin part 12 between adjacent ridge parts 10b, includes: a mold formation step for cutting groove parts on a mold base material 50 by a single-crystal diamond cutter 200 so that the width of each groove is 4 μm or less; a resin formation step for applying pressure immersion of heated mold to a coating surface of a substrate obtained by applying uncured resin to a surface on which a seed layer is formed, and thereafter cooling the uncured resin to temperature at which the uncured resin is cured, separating the mold from the substrate to form the resin part having a projected part and a groove part; and a formation step of a ridge part of a diffraction grating for forming the ridge parts by electroforming a metal of thickness capable of changing, by π/2, phase of an x-ray to be applied when the groove part obtains an image by an x-ray interferometer to the groove part of the resin part.
机译:解决的问题:提供一种能够容易且高精度地制造用于X射线Talbot干涉仪的相位型衍射光栅而无需曝光掩模的方法。解决方案:用于制造x-射线的相位型衍射光栅10的方法。通过形成多个脊部10b并将树脂部12插入相邻的脊部10b之间而构成的ray Talbot干涉仪,包括:模具形成步骤,该模具形成步骤用于通过单晶金刚石切割机在模具基材50上切断槽部。 200,使得每个凹槽的宽度为4μm或更小;树脂形成步骤,用于对通过将未固化的树脂施加到其上形成有籽晶层的表面而获得的基板的涂覆表面施加加热的模具的压力浸没,然后将未固化的树脂冷却至未固化的树脂固化的温度,将模具与基板分离,以形成具有凸部和槽部的树脂部。衍射光栅的脊部的形成步骤,该脊部的形成步骤是通过电铸形成厚度的金属而形成脊部的,该厚度能够使当凹槽部通过图像获得图像时所施加的x射线的相位改变π/ 2。 X射线干涉仪将树脂部分的凹槽部分。

著录项

  • 公开/公告号JP2012225660A

    专利类型

  • 公开/公告日2012-11-15

    原文格式PDF

  • 申请/专利权人 SEIKO INSTRUMENTS INC;

    申请/专利号JP20110090609

  • 发明设计人 SHIRAKAWABE YOSHIHARU;NAKAGAWA YOSHITOMO;

    申请日2011-04-15

  • 分类号G01N23/04;G01N23/20;G01T7/00;

  • 国家 JP

  • 入库时间 2022-08-21 17:01:10

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