MANUFACTURING METHOD FOR REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY (EUVL), AND MANUFACTURING METHOD FOR SUBSTRATE HAVING REFLECTIVE LAYER FOR EUVL

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method for an EUV mask blank, which can suppress adherence of a film material at the extraction or transfer of the film material, which adheres to a glass substrate holding unit, to a glass substrate.;SOLUTION: A manufacturing method for a reflective mask blank for EUVL comprises the step of forming a reflective layer and an absorption layer on a glass substrate 10 using a sputtering apparatus. The sputtering apparatus comprises a substrate holding unit 20 for holding a rear surface side of the glass substrate 10; a shielding unit 30 for covering at least a part of the entire periphery of a side face of the glass substrate 10 and the entire periphery of a side face of the substrate holding unit 20 in the thickness direction including an upper end of the substrate holding unit 20, covering an outer peripheral part of a film-formation surface of the glass substrate 10, having an opening for loading, and being capable of moving vertically between the position of loading and the position of the film formation; and an arm for loading the glass substrate 10 or a reflective mask blank for EUVL after the manufacture. The opening for loading, the glass substrate 10, and the arm for loading satisfy a predetermined condition.;COPYRIGHT: (C)2013,JPO&INPIT