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PLATING CURRENT DENSITY DISTRIBUTION MEASUREMENT DEVICE AND PLATING CURRENT DENSITY DISTRIBUTION MEASUREMENT METHOD

机译:放置电流密度分布测量装置和放置电流密度分布测量方法

摘要

PROBLEM TO BE SOLVED: To provide a unit that achieves accurate measurement of in-plane distribution of a plating current density in a cathode plate.;SOLUTION: The plating current density distribution measurement device includes: a plating bath; an anode and a member to be plated that are at least partially disposed under the surface of a plating solution contained in the plating bath; a first current measuring body comprising a first insulator and a first measurement electrode formed on one surface of the first insulator and disposed so that the first insulator faces a part of the surface to be plated of the member to be plated; a plating power supply; a first wiring for electrically connecting an anode terminal of the plating power supply to the anode; a second wiring for electrically connecting a cathode terminal of the plating power supply to the member to be plated; a third wiring for electrically connecting the cathode terminal of the plating power supply to the first measurement electrode so that the first measurement electrode and the member to be plated form a parallel relationship; and a first current measurement device disposed in the third wiring.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种能够准确测量阴极板上的电镀电流密度的面内分布的单元。解决方案:电镀电流密度分布测量装置包括:电镀液;阳极和被镀部件至少部分地布置在镀浴中所包含的镀液的表面下方;第一电流测量体,其包括第一绝缘体和第一测量电极,该第一测量电极形成在第一绝缘体的一个表面上并且被布置为使得第一绝缘体面对被镀部件的被镀表面的一部分;电镀电源;第一布线,用于将电镀电源的阳极端子电连接至阳极;第二布线,用于将电镀电源的阴极端子电连接至待镀部件;第三布线,其将电镀电源的阴极端子电连接至第一测量电极,以使第一测量电极与被镀部件形成平行关系。 ;第一电流测量装置布置在第三布线中。;版权所有:(C)2013,日本特许厅&INPIT

著录项

  • 公开/公告号JP2013057098A

    专利类型

  • 公开/公告日2013-03-28

    原文格式PDF

  • 申请/专利权人 YUKEN INDUSTRY CO LTD;

    申请/专利号JP20110195666

  • 发明设计人 KIKUCHI YOSHIHARU;

    申请日2011-09-08

  • 分类号C25D13/22;

  • 国家 JP

  • 入库时间 2022-08-21 16:58:28

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