CALCULATION METHOD OF VARIATION IN IMAGING CHARACTERISTICS OF PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE AND MANUFACTURING METHOD OF DEVICE

摘要

PROBLEM TO BE SOLVED: To determine variation in the imaging characteristics of a projection optical system more accurately.;SOLUTION: A method of calculating variation in the imaging characteristics of a projection optical system includes a step for calculating the exposure factor, i.e., the variation in imaging characteristic per unit exposure energy, of a first wavelength band by using the data of variation in the optical characteristics of a projection optical system when the exposure light for exposing a substrate is in the first wavelength band, a step for calculating the exposure factor of a second wavelength band by using the exposure factor of the first wavelength band, and a step for calculating the variation in the imaging characteristics of a projection optical system, when exposing a substrate by using the exposure light in the second wavelength band, by using the exposure factor of the second wavelength band.;COPYRIGHT: (C)2013,JPO&INPIT