It possesses the mirror (M1, M2, M3, M4, M5 and M6) which possesses the multiple multilayer films which include one substrate where EUV projection

摘要

PROBLEM TO BE SOLVED: To provide a projection lens (1) for short wavelength specifically for the wavelength of 157 nm, which is provided with a plurality of mirrors (M1, M2, M3, M4, M5, M6) disposed at a precise position related to an optical axis (5).;SOLUTION: The mirrors (M1, M2, M3, M4, M5, M6) are provided with multilayer films. At least two different mirror materials are employed which are different in the inclination of each thermal expansion coefficient, specifically different in the signal of an inclination value according to a temperature around the zero transition temperature of the thermal expansion coefficient.;COPYRIGHT: (C)2011,JPO&INPIT