Correction method of detection method and the beam irradiation position error of the beam irradiation position error

摘要

PROBLEM TO BE SOLVED: To provide a method of detecting a beam irradiation position error that is also applicable when forming a micropattern using a chemistry amplification type resist.;SOLUTION: At least two line patterns L1 which are constituted by that a plurality of rectangular patterns P1 continue in a Y direction are formed, and line patterns L2, L4 constituted by that a plurality of triangle patterns P2, P4 continue in a Y direction are formed. The lithography of the triangle patterns P2, P4 is carried out respectively considering the amount of a swing return established beforehand. The dimension CD1x between the line patterns L1, the dimension CD2x between line patterns L1, L2, and the dimension CD4x between line patterns L1, L4 are measured by a sizer. The difference of the CD1x and CD2x, the difference of the CD1x and CD4x are obtained as the error of the swing return amount in an X direction.;COPYRIGHT: (C)2010,JPO&INPIT