首页> 外国专利> PROGRAM FOR CORRECTING IRRADIATION POSITION OF CHARGE PARTICLE BEAM, COMPUTING DEVICE FOR CORRECTION AMOUNT OF IRRADIATION POSITION OF CHARGE PARTICLE BEAM, CHARGE PARTICLE BEAM IRRADIATION SYSTEM, AND METHOD FOR CORRECTING IRRADIATION POSITION OF CHARGE PARTICLE BEAM

PROGRAM FOR CORRECTING IRRADIATION POSITION OF CHARGE PARTICLE BEAM, COMPUTING DEVICE FOR CORRECTION AMOUNT OF IRRADIATION POSITION OF CHARGE PARTICLE BEAM, CHARGE PARTICLE BEAM IRRADIATION SYSTEM, AND METHOD FOR CORRECTING IRRADIATION POSITION OF CHARGE PARTICLE BEAM

机译:用于校正带电粒子束的照射位置的程序,用于校正带电粒子束的照射位置的装置,带电粒子束的照射系统以及用于校正带电粒子束的照射位置的方法

摘要

PROBLEM TO BE SOLVED: To provide a program for correcting an irradiation position of a charge particle beam, a computing device for a correction amount of an irradiation position of a charge particle beam, a charge particle beam irradiation system, and a method for correcting an irradiation position of a charge particle beam, by which an irradiation position of a charge particle beam can be accurately corrected and positional accuracy of a drawing pattern can be improved.;SOLUTION: The program for correcting an irradiation position of an electron beam operates a control unit 22 to function as: charge density distribution computing means for regarding charges in a resist as surface charges on an interface of a resist R and a mask substrate M and computing a charge density distribution of the substituted surface charges; trajectory computing means for computing a trajectory of a charged particle based on the charge density distribution; error amount computing means for computing an error amount of an irradiation position of the electron beam based on the trajectory of the charged particle; and irradiation position correction amount computing means for computing a correction amount for the irradiation position of the electron beam based on the error amount.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:提供一种用于校正电荷粒子束的照射位置的程序,用于校正电荷粒子束的照射位置的计算装置,电荷粒子束照射系统以及用于校正电荷粒子束的照射方法的方法。电荷粒子束的照射位置,可以准确地校正电荷粒子束的照射位置,并且可以提高绘制图案的位置精度。解决方案:用于校正电子束的照射位置的程序控制单元22用作:电荷密度分布计算装置,用于将抗蚀剂中的电荷视为在抗蚀剂R和掩模基板M的界面上的表面电荷,并计算取代的表面电荷的电荷密度分布;轨迹计算装置,用于基于电荷密度分布来计算带电粒子的轨迹。误差量计算装置,用于根据带电粒子的轨迹计算电子束的照射位置的误差量。照射位置校正量计算装置,用于基于误差量计算电子束的照射位置校正量。COPYRIGHT:(C)2014,JPO&INPIT

著录项

  • 公开/公告号JP2014183098A

    专利类型

  • 公开/公告日2014-09-29

    原文格式PDF

  • 申请/专利权人 DAINIPPON PRINTING CO LTD;

    申请/专利号JP20130055276

  • 发明设计人 OZAWA HIDENORI;OKAWA YOHEI;

    申请日2013-03-18

  • 分类号H01L21/027;H01J37/305;

  • 国家 JP

  • 入库时间 2022-08-21 16:18:55

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