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Group III method of manufacturing a nitride semiconductor fine columnar crystals and group III nitride structure

机译:制造氮化物半导体细柱状晶体的III族方法和III族氮化物结构

摘要

PROBLEM TO BE SOLVED: To control the position and the shape of the fine columnar crystals of a group III nitride semiconductor by selectively growing the fine columnar crystals composed of the group III nitride semiconductor.;SOLUTION: This method for manufacturing the fine columnar crystals includes a process for forming a film having a surface composed of a metal nitride or a metal oxide in a predetermined area of the surface of a substrate, and a process for introducing a growth raw material onto the surface of the substrate and growing fine columnar crystals composed of the group III nitride semiconductor at least on an area where the film is formed and the growth of the fine columnar crystals is accelerated.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:通过选择性地生长由III族氮化物半导体构成的细柱状晶体来控制III族氮化物半导体的细柱状晶体的位置和形状。解决方案:该制造细柱状晶体的方法包括在基板的表面的规定区域形成具有由金属氮化物或金属氧化物构成的表面的膜的工序,将生长原料导入基板的表面并使由其构成的微细的柱状晶体成长的工序III族氮化物半导体至少在形成膜的区域上生长并且细小柱状晶体的生长得到加速。;版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP5253740B2

    专利类型

  • 公开/公告日2013-07-31

    原文格式PDF

  • 申请/专利权人 学校法人上智学院;

    申请/专利号JP20070001812

  • 发明设计人 菊池 昭彦;岸野 克巳;

    申请日2007-01-09

  • 分类号C30B29/62;H01L21/203;H01L21/205;C30B29/38;C30B29/40;

  • 国家 JP

  • 入库时间 2022-08-21 16:55:43

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