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Being manner in order the alignment to do the aforementioned wafer substrate manner in order the alignment to do the wafer

机译:以对准方式做上述晶片基板以对准方式做晶片

摘要

PROBLEM TO BE SOLVED: To provide an alignment system enabling measurement and modeling of an asymmetrical target, special design and/or delicate adjustment of a target geometry (geometric structure) in order to correct drawbacks of the conventional method.;SOLUTION: By forming one or more sub-targets on an alignment target, the alignment target is made to have a geometry design. An alignment system aligns one or all the plurality of sub-targets. An algorithm is used for characterizing process and calculating alignment of the alignment system.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种对准系统,该对准系统能够对不对称目标进行测量和建模,对目标几何形状(几何结构)进行特殊设计和/或精细调整,以纠正传统方法的缺点。对准目标上的一个或多个子目标,则使对准目标具有几何设计。对准系统对准一个或全部多个子目标。一种算法用于刻画对准过程和计算对准系统的对准。;版权所有:(C)2008,JPO&INPIT

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