首页> 外国专利> Defect coordinate measuring device, defect coordinates measuring method, a method for producing a mask, and reference mask

Defect coordinate measuring device, defect coordinates measuring method, a method for producing a mask, and reference mask

机译:缺陷坐标测量装置,缺陷坐标测量方法,掩模的制造方法以及基准掩模

摘要

A defect coordinates measurement method includes a step of detecting detected coordinates of a fiducial mark and a defect of a mask blank placed on support pins, a step of detecting detected coordinates of the alignment mark of a reference mask placed on the support pins, a step of extracting a reference mark near the detected coordinates of the defect among the plurality of reference marks based on the detected coordinates of the defect of the mask blank and the alignment mark of the reference mask, a step of detecting detected coordinates of the extracted reference mark, and a step of calculating coordinates of the defect based on the detected coordinates of the reference mark and the detected coordinates of the defect.
机译:缺陷坐标测量方法包括检测检测到的基准标记的坐标和放置在支撑销上的掩模坯的缺陷的步骤,检测检测到的放置在支撑销上的参考掩模的对准标记的坐标的步骤,根据掩模坯料的缺陷的检测坐标和参考掩模的对准标记在多个参考标记中的缺陷的检测坐标附近提取参考标记的步骤,检测提取的参考标记的检测坐标的步骤以及基于检测到的基准标记的坐标和检测到的缺陷的坐标来计算缺陷的坐标的步骤。

著录项

  • 公开/公告号JP5126917B1

    专利类型

  • 公开/公告日2013-01-23

    原文格式PDF

  • 申请/专利权人 レーザーテック株式会社;

    申请/专利号JP20120057168

  • 发明设计人 宮井 博基;楠瀬 治彦;

    申请日2012-03-14

  • 分类号H01L21/027;G03F1/24;G03F1/84;

  • 国家 JP

  • 入库时间 2022-08-21 16:55:15

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