The positive resist composition containing the novel sulfonium compounds, the positive resist composition pattern forming method using a novel and sulfonium compounds

摘要

PROBLEM TO BE SOLVED: To provide: a positive resist composition excellent in sensitivity, resolution, roughness, pattern profile and outgassing property; a compound for use in the positive resist composition; and a pattern-forming method using the positive resist composition, with respect to a positive resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes and a pattern-forming method using the positive resist composition.;SOLUTION: The compound is a triarylsulfonium compound which has a sulfonium cation having a substituent containing an alcoholic hydroxyl group and an anion containing a proton acceptor functional group. The positive resist composition includes the compound. The pattern-forming method uses the positive resist composition.;COPYRIGHT: (C)2009,JPO&INPIT