Being the minute pattern observation device which observes the minute pattern which is formed on

摘要

PROBLEM TO BE SOLVED: To provide a micropattern correction device capable of obtaining an observation images free from generating unevenness.;SOLUTION: The micropattern correction device comprises: a glass surface plate 2 to mount a glass substrate 1 to be corrected; a line light 4 for irradiating the glass substrate 1 with transmitted illumination light from downward; an observation optical system 5 for observing the surface of the glass substrate 1 from upward; and cylinders 10 to 19 and pins 20 to 29 for shifting the position of the glass substrate 1 on the glass surface plate 2, when a part on the surface of the glass substrate 1 desired to be observed is positioned on the small holes 2a or lifter pin holes 2b of the glass surface plate 2. Therefore, the generation of unevenness on the observation images caused by the small holes 2a or the lifter pin holes 2b of the glass surface plate 2 can be inhibited.;COPYRIGHT: (C)2009,JPO&INPIT