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Method for extracting a distribution of the stored charge in the semiconductor device

机译:提取半导体器件中存储电荷分布的方法

摘要

The present invention discloses in a method to extract the spatial distribution of charge stored in a charge-trapping layer of a semiconductor device. The method comprises the steps of performing a first charge-pumping measurement on a device under test using a variation of the upper level of the pulse and performing a second charge-pumping measurement on this device using a variation of the lower level of the pulse. The data obtained is combined for extracting the spatial distribution. This is done by establishing a relation between a charge pumping current I cp and a calculated channel length L calc of the semiconductor device by reconstructing a spatial charge distribution from the charge pumping curves for multiple values of the charge pumping current I cp . From these multiple values of I cp the value for which the corresponding calculated channel length L calc is substantially equal to the effective channel length L eff of the semiconductor device, reconstructing the spatial charge distribution from the charge pumping curves using the value of l cp obtained in step e).
机译:本发明公开了一种提取存储在半导体器件的电荷俘获层中的电荷的空间分布的方法。该方法包括以下步骤:使用脉冲的上电平的变化在被测设备上执行第一电荷泵测量,以及使用脉冲的下电平的变化在该设备上执行第二电荷泵测量。合并获得的数据以提取空间分布。通过根据电荷泵浦电流I cp的多个值从电荷泵浦曲线重构空间电荷分布,通过建立电荷泵浦电流I cp与半导体器件的计算出的沟道长度L calc之间的关系来实现这一点。根据I cp的这些多个值,其对应的计算出的沟道长度L calc基本上等于半导体器件的有效沟道长度L eff的值,使用所获得的l cp的值从电荷泵浦曲线重建空间电荷分布在步骤e)中。

著录项

  • 公开/公告号JP5148076B2

    专利类型

  • 公开/公告日2013-02-20

    原文格式PDF

  • 申请/专利权人 アイメック;

    申请/专利号JP20060154455

  • 申请日2006-06-02

  • 分类号H01L21/336;H01L29/788;H01L29/792;H01L21/8247;H01L27/115;G11C16/02;G11C16/04;

  • 国家 JP

  • 入库时间 2022-08-21 16:54:47

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