Impression radiation characteristic composition and new chemical compound

摘要

It is to offer the impression radiation characteristic composition and the like which purpose of this invention be superior can respond form a membrane in sensitivity, and resolution, the KrF excimer laser and the ArF excimer laser, (the pole) of EUV and the like the x-ray of the far ultraviolet ray and synchrotron radiation etc, nano- edge roughness, at the same time in high accuracy stabilizing minute pattern, the formation possible chemical expansion type positive type resist membrane effectively to the electronic beam. The impression radiation characteristic composition of this invention contains, are shown with the below-mentioned general formula (1) the acid occurrence medicine and the solvent which and. (In formula, R¹ in independence, the hydrogen atom, shows the fluorine atom, or substitution or non substitution the organic basis mutually, at the same time inside R¹ at least one shows the organic basis where portion or all of the fluorine atom or the hydrogen atom are substituted with the fluorine atom. R² mutually in independence, the substitution which one possesses ester connection at least or shows the organic basis of 1 value of non substitution. n shows integer 0 - 3. M ⁺ shows oniumukachion of 1 value.)