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The impression radiation characteristic resin composition and the chemical compound which is included in that

机译:包含在其中的印象放射线特征树脂组合物和化合物

摘要

The below-mentioned general formula (A) (R1, R2, in the respective independence, substitution or carbon count shows the hydrocarbon radical of 1 of 1 value of non substitution - 25, X and Z, in the respective independence, substitution or carbon count shows the hydrocarbon radical of 2 value of 1 of non substitution - 25, Y shows single bond and the like, n shows integer 0 - 5.)So the chemical compound which is displayed (A) and the resin which possesses the solvent (B) and the acid dissociation characteristic basis (C) and, the impression radiation characteristic resin composition which is contained is offered.
机译:下述通式(A)(R 1 ,R 2 在各自的独立性,取代基或碳数中,表示n = 1的烃基中的1。取代-25,X和Z在各自的独立性,取代或碳数中显示2值为非取代的1的烃基-25,Y表示单键等,n表示整数0-5。)提供所显示的化合物(A)和具有溶剂(B)和酸离解特性基准(C)的树脂,并且包含所包含的印象辐射特性树脂组合物。

著录项

  • 公开/公告号JPWO2011077941A1

    专利类型

  • 公开/公告日2013-05-02

    原文格式PDF

  • 申请/专利权人 JSR株式会社;

    申请/专利号JP20110547450

  • 发明设计人 丸山 研;

    申请日2010-12-07

  • 分类号G03F7/004;G03F7/039;C07C309/75;C07C303/28;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 16:53:26

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