Semiconductor shape evaluation system using the same pattern shape evaluation method, pattern shape evaluation apparatus, and pattern shape evaluation data generation equipment

摘要

PROBLEM TO BE SOLVED: To provide a means for detecting the failure of a circuit pattern accurately with high speed by comparing the pattern, formed on a photo mask or a wafer, with design data.;SOLUTION: The evaluating method, provided with a means for extracting the profile data 0107 of a pattern out of an image which photographed a semiconductor pattern, a means for producing data related to the direction of a pattern out of the design data 0102 of the semiconductor and a means for detecting the failure of the pattern by obtaining the data of direction of the pattern out of the profile data to compare with the data related to the direction of the pattern produced out of the design data corresponding to the pattern position of the profile data, and an inspection system are built up.;COPYRIGHT: (C)2009,JPO&INPIT