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Electrode member and the surface roughness forming method using the plasma etching process
Electrode member and the surface roughness forming method using the plasma etching process
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机译:使用等离子蚀刻工艺的电极构件和表面粗糙度形成方法
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摘要
A substrate having a surface irregularity of a predetermined provide surface texturing process using plasma etching process can be obtained with high precision and stable, the electrode member and obtained by forming such a method. When performing the plasma etching process, as well as having fine surface irregularities, and a surface roughening method in which is used as a resist metal salt film was partially oxidized, on a substrate, forming a surface relief pattern of a given group a first step for the wood, by applying a metal salt-containing liquid material to form a metal salt layer, a metal salt film, it is possible to form fine surface irregularities, second by partial oxidation, and resist a step of, together with the resist, and plasma etching the substrate, the substrate, and a third step of forming a surface roughness given.
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