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Electrode member and the surface roughness forming method using the plasma etching process

机译:使用等离子蚀刻工艺的电极构件和表面粗糙度形成方法

摘要

A substrate having a surface irregularity of a predetermined provide surface texturing process using plasma etching process can be obtained with high precision and stable, the electrode member and obtained by forming such a method. When performing the plasma etching process, as well as having fine surface irregularities, and a surface roughening method in which is used as a resist metal salt film was partially oxidized, on a substrate, forming a surface relief pattern of a given group a first step for the wood, by applying a metal salt-containing liquid material to form a metal salt layer, a metal salt film, it is possible to form fine surface irregularities, second by partial oxidation, and resist a step of, together with the resist, and plasma etching the substrate, the substrate, and a third step of forming a surface roughness given.
机译:可以高精度且稳定地获得具有使用等离子体蚀刻工艺的预定的表面不规则表面凹凸结构的基板,电极构件并通过形成这种方法获得。进行等离子蚀刻处理时,除了具有微细的表面凹凸以外,还,在基板上部分氧化了用作抗蚀剂金属盐膜的表面粗糙化方法,从而形成给定的组的表面浮雕图案。对于木材,通过施加含金属盐的液体材料以形成金属盐层,金属盐膜,可以形成细微的表面不规则性,其次是通过部分氧化,并与抗蚀剂一起进行抗蚀剂步骤,等离子体蚀刻衬底,衬底和形成给定表面粗糙度的第三步骤。

著录项

  • 公开/公告号JPWO2011118238A1

    专利类型

  • 公开/公告日2013-07-04

    原文格式PDF

  • 申请/专利权人 リンテック株式会社;

    申请/专利号JP20110523259

  • 发明设计人 近藤 健;永縄 智史;

    申请日2011-01-05

  • 分类号H01L21/3065;H01L31/04;

  • 国家 JP

  • 入库时间 2022-08-21 16:54:06

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