首页> 外国专利> Copper surface treatment solution set, a surface treatment method for copper using the same, copper, a wiring board and a semiconductor package

Copper surface treatment solution set, a surface treatment method for copper using the same, copper, a wiring board and a semiconductor package

机译:铜表面处理液组,使用该铜表面处理液组的铜的表面处理方法,铜,布线板和半导体封装

摘要

PROBLEM TO BE SOLVED: To provide a copper surface treatment liquid set with which fine ruggedness with the Rz of ≤1 μm can be densely and uniformly formed on the surface of copper in a short time, to provide a surface treatment method for copper using the treatment liquid set, to provide copper surface-treated applying the surface treatment method, to provide a wiring board having copper wiring surface-treated applying the surface treatment method, and to provide a semiconductor package obtained by using the board.;SOLUTION: The copper surface treatment liquid set is provided with: an acidic noble metal treatment liquid comprising the salt of a metal nobler than copper and discretely forming a metal nobler than copper on the surface of copper; and an alkaline oxidation treatment liquid comprising a phosphate and an oxidizer and oxidizing the surface of copper. Upon its use, a metal nobler than copper is discretely formed on the surface of copper using the noble metal treatment liquid, and thereafter, the copper surface is subjected to oxidation treatment using the oxidation treatment liquid, thus fine ruggedness by the dense and uniform crystals of copper oxide can be formed on the copper surface.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种铜表面处理液组,其能够在短时间内在铜表面上致密且均匀地形成Rz为1μm的精细的凹凸不平,从而提供一种表面处理方法。使用处理液套装铜,以提供经表面处理方法进行了表面处理的铜,提供具有经表面处理方法进行了表面处理的铜布线的布线板,并提供通过使用该板获得的半导体封装。铜表面处理液组包括:酸性贵金属处理液,其包含比铜贵金属的盐并且在铜表面上离散地形成比铜贵的金属盐;和碱性氧化处理液,其包含磷酸盐和氧化剂并氧化铜的表面。使用时,使用贵金属处理液在铜的表面上不连续地形成比铜更贵的金属,然后,使用该氧化处理液对铜表面进行氧化处理,从而通过致密且均匀的结晶而具有良好的凹凸性。可以在铜表面上形成氧化铜。;版权所有:(C)2008,日本特许厅&INPIT

著录项

  • 公开/公告号JP5109400B2

    专利类型

  • 公开/公告日2012-12-26

    原文格式PDF

  • 申请/专利权人 日立化成工業株式会社;

    申请/专利号JP20070039883

  • 发明设计人 井上 文男;山下 智章;

    申请日2007-02-20

  • 分类号C23C22/78;C23C22/63;C23C22/83;H05K3/38;

  • 国家 JP

  • 入库时间 2022-08-21 16:54:00

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