Positive photoresist composition, the novolak type phenolic resin coating and the

摘要

An object of the present invention is to provide a positive photoresist composition having excellent developing properties and heat resistance and a coating film made from the composition. A positive photoresist composition includes 3 to 80 parts by mass of a novolac phenol resin (B) relative to 100 parts by mass of a cresol novolac resin (A). The novolac phenol resin (B) has a repeating structural unit represented by formula (1) [In the formula, R represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms and X represents a structure (x1) represented by formula (2) (In the formula, R 1 , R 2 , and R 3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms; m and n each independently represent an integer of 1 to 4; p represents an integer of 0 to 4; and t represents 1 or 2) or an aromatic hydrocarbon group (x2) other than the structure (x1)]. The content of the structure (x1) relative to the total number of the structure (x1) and the structure (x2) is 85% or more.