Positive photoresist composition, the novolak type phenolic resin coating and the

摘要

Aiming to provide a coating film using the same positive photoresist composition having excellent heat resistance and developing property, cresol novolak resin (A) with respect to 100 parts by weight of novolak type phenol resin invention (B In a positive photoresist composition 3-80 parts by mass of a), resin (B) is a group represented by the formula (1) [Wherein, R is a hydrocarbon group having 1 to 12 carbon atoms or a hydrogen atom. Formula X (2) (In the ^formula, n and .m a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an integer of ^1~4, 2, ^{R 3 R 1, R} is, p are each independently are each independently The structure represented by) 1 or 2 or (x1), an aromatic hydrocarbon group of the structure (x1) than .t is an integer of 0 to 4 is (x2). ] has as a repeating unit a structural unit represented by the formula, to provide a positive photoresist composition content of the structure to the total number and (x1) structure (x2) structure (x1) is 85% or more.